Say Hello to the New Generation
of Wide Bandgap CVD Systems
The ER3 CVD systems are from the beginning designed for 200 mm wafers. They have a unique hot-wall design to optimize temperature homogeneity, a patented gas flow injector for optimum growth rate and doping uniformity as well as hot load of pre-heated wafers.
This is the new generation of wide bandgap CVD reactors.
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