Epiluvac has received the first order for two new Chemical Vapor Deposition (CVD) systems in a double configuration. The systems will be used by Lukasiewicz Research Network – Institute of Microelectronics and Photonics in Warsaw, Poland. This institute is one of the world leading research facilities for advanced semiconductors. The CVD-systems are designed with Epiluvac ER3 reactors for 8-inch wafers epitaxy of silicon carbide (SiC) and gallium nitride (GaN). They are intended to be used for R&D in new materials technology.

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