Say Hello to the New Generation
of Wide Bandgap CVD Systems

The ER3 CVD systems are from the beginning designed for 200 mm wafers. They have a unique hot-wall design to optimize temperature homogeneity, a patented gas flow injector for optimum growth rate and doping uniformity as well as hot load of pre-heated wafers.

This is the new generation of wide bandgap CVD reactors.