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Epiluvac has received the first order for two new Chemical Vapor Deposition (CVD) systems in a double configuration. The systems will be used by Lukasiewicz Research Network – Institute of Microelectronics and Photonics in Warsaw, Poland. This institute is one of the world leading research facilities for advanced semiconductors. The CVD-systems are designed with Epiluvac ER3 reactors for 8-inch wafers epitaxy of silicon carbide (SiC) and gallium nitride (GaN). They are intended to be used for R&D in new materials technology.
Download the full press release here.
Dr. Elmér has extensive experience from senior management and board positions in growing tech companies. This experience is essential for Epiluvac when moving in to the next phase of international scale-up. First steps for the new board is to create a solid growth plan for the coming years and then prepare for a capital injection to be able to meet the rapidly growing market demand of systems for new smart materials.
– Epiluvac is at the forefront of the greentech revolution within solid state technology and their new systems makes it possible to move rapidly to new smart WBG materials like silicon carbide #SiC and gallium nitride #GaN in the power, automotive and telecom industries, says Dr. Rolf Elmér, and I am looking forward to work with this exciting technology company which is at a pivotal moment in its development.
Dr. Elmér holds a PhD in Physics from Lund University and a MBA from Stockholm School of Economics.
The latest research developments in the Swedish Centre for III-Nitride Technology were presented in the one-day workshop in Linköping 12 November. Several invited talks by leading international experts in the field of nitride technology. Epiluvac is one of the industry partners in the competence centre.
It was five days with exciting presentations and great networking. Thanks to all of you who stopped at our booth and got more information about our new automated ER3-reactor ready for 200 mm SiC wafers.
Read & learn more:
Videos and slides from CUSP™
Wide Band Gap (WBG) Devices
- 28 videos covering different topics including lecture slides.
The Journal of Physical Chemistry C
- Extensive presentation of CVD modeling with new findings regarding the growth chemistry.
Journal of Vacuum Science & Technology A
Surface ligand removal in atomic layer deposition of GaN using triethylgallium
- Presentation of new findings regarding the ALD growth of GaN.
Epiluvac is a privately held Swedish company founded 2013 by a team of engineers with decades of research and development experience from the CVD reactor field and especially hot-wall CVD epitaxy equipment for Silicon Carbide. Epiluvac provides standard as well as customized reactor solutions and a wide range of service and maintenance packages. Recent customized solutions include reactor designs for graphene and nanowire manufacturing among others.
Epiluvac has received the first order for two new Chemical Vapor Deposition (CVD) systems in a...
Dr. Elmér has extensive experience from senior management and board positions in growing tech...
The latest research developments in the Swedish Centre for III-Nitride Technology were presented...