Say Hello to the New Generation
of Wide Bandgap CVD Systems

The ER3 CVD systems are from the beginning designed for 200 mm wafers. They have a unique hot-wall design to optimize temperature homogeneity, a patented gas flow injector for optimum growth rate and doping uniformity as well as hot load of pre-heated wafers.

This is the new generation of wide bandgap CVD reactors.

C3NiT Centre Day

The latest research developments in the Swedish Centre for III-Nitride Technology were presented...

News

ECSCRM 2020-2021 in Tours, France, October 24-28

Our 200 mm CVD epitaxy systems for Silicon Carbide and Gallium Nitride got a lot of attention. This is the new generation of CVD systems, designed from the beginning for 150 and 200 mm wafers. Thanks to all of you who stopped and watched the video, showing the...

Epiluvac supplies ground-breaking CVD reactors

Epiluvac has received the first order for two new Chemical Vapor Deposition (CVD) systems in a double configuration. The systems will be used by Lukasiewicz Research Network - Institute of Microelectronics and Photonics in Warsaw, Poland. This institute is one of the...